To achieve high efficiency crystalline silicon solar cells, the uniformity and reproducibility of the emitter plays a major role. The knowledge of the emitter sheet resistance across the surface of a single wafer, and of the reproducibility from wafer to wafer is essential in optimizing the emitter diffusion process.
Selective emitter and emitter sheet resistance mapping:
Map the emitter sheet resistance across the wafer surface.
Determine the type of the wafer.
Metal resistance determination:
Determine the sheet resistance, and also the specific resistivity of the metal.
For selective emitter measurements we have developped a special Sherescan PC software. Please check the support page or contact us.
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- Selective emitter
Emitter sheet resistance mapping
The typical example of emitter sheet resistance mapping using a 10x 10 measurement location matrix. This measurement takes about 9 minutes. The figure to the right represents a high resolution mapping with a 100 x 100 matrix. In the figure it is possible to see the belt imprint, meaning that through optimization of the settings of the diffusion IR furnace, a more uniform emitter can be obtained.
Sheet resistance mapping of emitter
High resolution resistance mapping of emitter
Selective emitter sheet resistance mapping
Selective emitters are of high interest to the photovoltaics industry since they can boost solar cell performance by 0.6% absolute. Nowadays, turn-key equipment can be purchased to realize selective emitters in industrial solar cell manufacturing processes.